Product category:
Materials Testing
News Release from: Alliance Sales (Europe) | Subject: Collimated console micro-beam XRF (MXRF) tool
Edited by the Manufacturingtalk Editorial
Team on 12 February 2007
Measurement gains with micro beam X-ray
tool
The new CXR tool from Alliance Sales produces 20-100 micron measurement beams capable of simultaneous multiple metal stack film thickness
A collimated console micro-beam XRF (MXRF) tool was launched by Alliance Sales (Europe) Utilising exclusive Optical Elements the new CXR tool from Alliance Sales produces 20-100 micron measurement beams capable of simultaneous multiple metal stack film thickness and composition determination
This article was originally published on Manufacturingtalk on 12 Feb 2007 at 8.00am (UK)
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Alliance Sales (Europe) has been appointed by Johnstech International for sales and technical support of its range of high performance test and interconnect products for the semiconductor industry.
Compared with existing tool technology the use of optically collimated x-rays delivers precision gains of up to 1000 times.
The new technology is ideal for rapid non-contact non-destructive metal film measurement in a production environment.
The CXR's revolutionary beam generator redirects and focuses x-rays to form a super intense x-ray beam resulting in an exceptionally brilliant micro-spot light source at the sample interface.
The technique significantly reduces measurement time while greatly increasing accuracy, precision and reproducibility.
The tool is designed for measurements on wafers, optical devices, and high density packaging and substrate applications.
Typical metal film measurements include Au, Pd, Ni, Sn, Sn-Pb, Pt, Va, Ge, Ti, Al, P, Cu, Cr and Fe.
The CXR platform is compatible with 150, 200 and 300mm wafer handling systems.
The platform, which incorporates a vibration isolation system, can be configured with different types of optical elements and detectors to optimise application specific measurements.
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