Product category:
Plating and plating systems
News Release from: Kebaili Corporation | Subject: Pulse generator for nano-electrodeposition
Edited by the Manufacturingtalk Editorial
Team on 02 April 2007
Pulse generator used in
nano-electrodeposition
A compact current pulse generator for use in electrodeposition applications in MEMS and nanotechnology, such as DC plating, pulse plating, and periodic reverse pulse plating.
Kebaili Corporation a leading California based high-tech company has released its CPG-500 Series - the industry first compact current pulse generator, specifically designed for electrodeposition applications, such as (direct current) DC plating, pulse plating, and periodic reverse pulse plating for a variety of applications in MEMS and nanotechnology According to Dr Mo Kebaili, chief technology officer of Kebaili Corporation, commercially available reverse pulse plating systems and potentiostat/galvanostat are typically large and usually not optimized for cleanroom environments
This article was originally published on Manufacturingtalk on 26 Jun 2001 at 8.00am (UK)
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The CPG-500 was ergonomically designed in a compact unit, and optimized for end-user applications in MEMS and nanotechnologies.
The CPG-500 power requirement is 100-240V AC at 50-60Hz, is microprocessor-controlled, is fully user programmable, and is self-contained with no need to connect to a PC.
The CPG-500 is very user friendly, it can be programmed for DC plating, pulse plating, or reverse pulse plating.
Further reading
If 'trich' is a problem, try this one
An aggressive cleaning solvent for medium to heavy-duty degreasing applications offers an ideal long-term replacement for n-propyl Bromide (nPB), Trichloroethylene (Trike), and other solvents.
Co-solvent cleaning process replaces 'trike'
Following a thorough review of available high performance solvents and systems, a plating company has replaced its trichloroethylene system with a semi-automatic co-solvent cleaning process.
CPG-500 can generate forward and reverse current pulses from 1 microA to 350 milliA, with a minimum pulse width of 1ms.
The compliance voltage is +/-10V.
The user can program 10 pulse waveforms and store the recipes in the CPG-500 internal non-volatile memory.
Kebaili CPG-500 offers impressive specifications, and is cost-effective for a wide range of research and development applications, and laboratory requirements, such as the following.
* - Reducing porosity and intrinsic stress, improving uniformity, increasing hardness and decreasing grain size of electroplated thin-films for physical, chemical, biological transducers and microsensors.
* - Silicon wafer through holes void free metallization of high aspect ratio microvias in microelectronic and microtechnology applications.
* - Metallic and alloy nanowires synthesis by electroplating through anodized aluminum templates in nanotechnology applications.
* - Micro-molds, micro-coils and metallic microstructures fabrication.
* - Electrodes fabrication for thin-film-based micro-batteries.
* - Micro-metallization in microfluidic devices and high aspect ratio micro-channel in biochip applications.
* - Platinum catalyst electrodeposition on polymeric exchange membrane (PEM) in micro fuel cell applications.
* - Microstructures fabrication for micro analytical instruments, and micro chemical plants.
* - Electrochemical deposition of bismuth telluride thin-films for micro-thermo electric cooling applications.
* - Electrodeposition of cobalt in anodized aluminum template as a precursor catalyst for carbon nanotubes synthesis by chemical vapor deposition (CVD).
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