New source increases uptime for cleaning

Diamonex CD Source G-2 provides a cost-effective substrate cleaning, etching, ion-assisted deposition and direct deposition solutions such as those found in optical manufacturing processes.

Morgan Advanced Ceramics, a supplier of innovative material and process solutions has launched its new Diamonex CD Source, G-2.

The new source features a simplified design with reduced maintenance and increased reliability.

The G-2 provides cost-effective substrate cleaning, etching, ion-assisted deposition and direct deposition solutions such as those found in semiconductor and optical manufacturing processes.

The G-2 CD Source features a front-change hollow-cathode which can be changed in just three minutes increasing uptime and product throughput.

The simplified design, with fewer parts, includes a keyed construction for reliable, fast disassembly and re-assembly - with a geometry that ensures the source can only be installed at the correct orientation.

To further reduce maintenance time, the G-2 CD Source provides a redesigned, quick-change anode surface.

Manufactured with advanced internal ceramic components for superior reliability, the G-2 CD Source provides long-term (170+ hours) operation in harsh, chemically reactive or deposition environments.

The Diamonex G-2 CD Source is a high current, low energy, broad-beam source.

The grid-less design provides high current densities of low-voltage ions for gentle cleaning or powerful etching, and ensures there is no grid erosion or clogging to contaminate the process or produce particles.

The Diamonex G-2 CD Source is capable of direct deposition of diamond-like carbon films with superior properties - very low coefficient of friction and hardness up to 40 GPa as well as other optical materials such as silicon dioxide, titanium dioxide, silicon nitride and amorphous silicon.

End products that require deposition of this kind include microscopic lenses, automotive headlights, eyewear and hard disk drives for data storage.

Additionally, the source has no process gas restrictions, making it ideal for ion-assisted deposition, etching and materials development applications.

For high-pressure applications, extended voltage ranges are available (from 40V to 170V).

Unlike many other ion sources, the Diamonex G-2 CD Source employs an electromagnet to increase process flexibility, allowing for detailed optimization of material properties.

Its Semi-certified DC power supplies ensure long-term stable operation.

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