Product category:
Metrology standards room equipment
News Release from: Mahr Federal | Subject: Measuring station roughness, waviness and contour
Edited by the Manufacturingtalk Editorial
Team on 28 September 2005
Station measures roughness, waviness and
contour
Combined measuring station that covers roughness, waviness and contour saves time, space and resources and enables semi-automatic high-precision contour and roughness evaluation.
The new MarSurf XCR 20 from Mahr Federal combines two high precision measuring systems into one, enabling both roughness and contour measurements to be taken on the same unit and with the same setup The combined measuring station incorporates drive units from the MarSurf XR 20 roughness and XC 20 contour systems
This article was originally published on Manufacturingtalk on 23 May 2008 at 8.00am (UK)
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The MarSurf GD 25 roughness drive unit (XR 20) and PCV 200 contour drive unit (XC 20) are attached via a twin mount to the same measuring stand.
There is no need to change the drive unit or probe when changing the measurement task from Roughness to Contour.
This translates to saving time, work space, and financial resources.
The MarSurf XCR 20 also allows certain operating sequences such as measuring stand positioning and drive unit positioning to be easily semi-automated.
Simulation modes allow users to quickly familiarize themselves with both systems, and 'Teach-In' commands allow the creation of 'Quick and Easy' measuring programs that can be saved and launched using programmable function keys.
The MarSurf XCR 20 incorporates all the high precision measurement features of the XR 20 and XC 20 roughness and contour systems, and is based on Mahr's modular Perthometer Concept for measuring surface roughness contours both in the laboratory and on the shop floor.
Because of this modularity, either the XR 20 roughness or XC 20 contour system can be upgraded to an XCR 20 roughness and contour measuring station at any time.
A complete range of surface measuring accessories is also available.
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