Multi-illumination, sub-micron measurement joined

Video measuring system for examining complex specimens in micro-electronics and metallurgy offers bright field, dark field, differential interference contrast and polarisation.

With the launch of the new Nikon NEXIV LU Video Measuring System, bright field, dark field, differential interference contrast and simple polarisation illumination techniques can all be brought to bear when examining and measuring complex specimens.

This degree of choice makes the new NEXIV ideal for use with semi-conductor, microelectronics and MEMS applications, which often require a variety of illumination techniques to highlight key features within samples such as: silicon wafers: multi-layer screen printed, MicroMiniature and opto electronics devices; and fibre arrays.

The NEXIV LU also meets the needs of metallurgists requiring automatic, accurate X, Y and X axis measurements to be made at high magnifications.

For simplicity of operation, the NEXIV LU is fitted with a Universal Epi-Illuminator that is pre-matched to the five objectives mounted on the automatic revolving nosepiece.

Together, these deliver unmatched image quality over the magnification range 50x to 1000x, Combining a guaranteed U2XY accuracy of up to 1.5+2.5L/1000 microns with unrivalled edge detection, the NEXIV LU represents the pinnacle of precision for tomorrow's manufacturing challenges, where sub-micron tolerances are demanded.

Rapid sample throughput is ensured by the use of advanced control technology and parallel data processing working in tandem with improved stage speeds of up to 300mm/sec.

Use of a progressive scan camera for rapid image capture enables the systems to run the stage and process the image simultaneously.

This results in a substantial reduction in measurement time and prevents the system from being affected by vibration.

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